Recent trends and developments of microwave discharges p. Pr7-1 J. Marec et P. Leprince DOI: https://doi.org/10.1051/jp4:1998701 RésuméPDF (2.227 MB)
Modeling of microwave reactors : microwave and kinetics in gas flow approaches p. Pr7-21 G. Gousset DOI: https://doi.org/10.1051/jp4:1998702 RésuméPDF (565.1 KB)
Calculation of spatially inhomogeneous electron distribution functions p. Pr7-33 L.L. Alves, G. Gousset et C.M. Ferreira DOI: https://doi.org/10.1051/jp4:1998703 RésuméPDF (426.6 KB)
Self consistent modeling of surface wave sustained discharges p. Pr7-43 H. Schlüter DOI: https://doi.org/10.1051/jp4:1998704 RésuméPDF (392.3 KB)
Collisionless electron heating in microwave discharges p. Pr7-53 Yu.M. Aliev DOI: https://doi.org/10.1051/jp4:1998705 RésuméPDF (256.6 KB)
Modeling electromagnetic fields for the excitation of microwave discharges used for materials processing p. Pr7-61 T.A. Grotjohn DOI: https://doi.org/10.1051/jp4:1998706 RésuméPDF (1.722 MB)
Fundamentals and limitations of large area planar microwave discharges using slotted waveguides p. Pr7-83 A. Ohl DOI: https://doi.org/10.1051/jp4:1998707 RésuméPDF (1.364 MB)
Duo-plasmaline, a surface wave sustained linearly extended discharge p. Pr7-99 E. Räuchle DOI: https://doi.org/10.1051/jp4:1998708 RésuméPDF (1.818 MB)
Linear field applicators p. Pr7-109 Z. Zakrzewski et M. Moisan DOI: https://doi.org/10.1051/jp4:1998709 RésuméPDF (962.6 KB)
Recent developments in DECR plasmas p. Pr7-121 T. Lagarde, J. Pelletier et Y. Arnal DOI: https://doi.org/10.1051/jp4:1998710 RésuméPDF (479.3 KB)
Etching of thin films using magnetised plasmas p. Pr7-133 J. Margot DOI: https://doi.org/10.1051/jp4:1998711 RésuméPDF (2.470 MB)
Modeling the transitions from capacitive to inductive to wave-sustained rf discharges p. Pr7-145 M.A. Lieberman et R.W. Boswell DOI: https://doi.org/10.1051/jp4:1998712 RésuméPDF (798.1 KB)
Control of power deposition profile for uniform plasma production in microwave and radio frequency ranges p. Pr7-165 Y. Yasaka DOI: https://doi.org/10.1051/jp4:1998713 RésuméPDF (408.8 KB)
Recent trends in the design of large RF, microwave and ECR ion sources for the production of broad ion beams p. Pr7-173 L. Wartski, Ph. Coste, C. Schwebel, J. Aubert et C. Fusellier DOI: https://doi.org/10.1051/jp4:1998714 RésuméPDF (1.377 MB)
Large microwave plasma reactor based on surface waves p. Pr7-187 C. Boisse-Laporte, N. Bénissad et S. Béchu DOI: https://doi.org/10.1051/jp4:1998715 RésuméPDF (376.0 KB)
Holey-plate structure surface-wave plasma source p. Pr7-195 Y. Yoshida DOI: https://doi.org/10.1051/jp4:1998716 RésuméPDF (828.1 KB)
Spectroscopical diagnostics of molecular microwave plasmas p. Pr7-207 J. Röpcke, M. Käning et B.P. Lavrov DOI: https://doi.org/10.1051/jp4:1998717 RésuméPDF (548.5 KB)
Diagnostics of deposition plasmas p. Pr7-217 D.C. Schram, M.C.M. van de Sanden, R. J. Severens et W.M.M. Kessels DOI: https://doi.org/10.1051/jp4:1998718 RésuméPDF (506.9 KB)
Mass spectrometry in plasma physics p. Pr7-231 M. Schmidt, R. Foest et R. Basner DOI: https://doi.org/10.1051/jp4:1998719 RésuméPDF (1.024 MB)
ICP diagnostics with magnetic probes p. Pr7-241 V.A. Godyak et R.B. Piejak DOI: https://doi.org/10.1051/jp4:1998720 RésuméPDF (737.0 KB)
Noise reduction in EEDF numerical differentiation technique p. Pr7-257 F.M. Dias et E. Tatarova DOI: https://doi.org/10.1051/jp4:1998721 RésuméPDF (374.6 KB)
Infrared absorption analysis of organosilicon/oxygen plasmas in a microwave multipolar plasma excited by distributed electron cyclotron resonance p. Pr7-265 P. Raynaud, C. Marlière, D. Berthomieux, Y. Segui, J. Durand et R. Burke DOI: https://doi.org/10.1051/jp4:1998722 RésuméPDF (410.0 KB)
Pulsed discharges produced by strong microwaves p. Pr7-275 A.L. Vikharev DOI: https://doi.org/10.1051/jp4:1998723 RésuméPDF (1.154 MB)
Time resolved temperature measurements in a H2 high power pulsed discharge p. Pr7-287 A. Rousseau, E. Teboul et P. Leprince DOI: https://doi.org/10.1051/jp4:1998724 RésuméPDF (438.1 KB)
Ignition phase of a pulsed microwave-excited oxygen plasma p. Pr7-297 A. Brockhaus, St. Behle, A. Georg et J. Engemann DOI: https://doi.org/10.1051/jp4:1998725 RésuméPDF (1.226 MB)
Pulsed waveguided discharges p. Pr7-307 D. Grozev, K. Kirov et A. Shivarova DOI: https://doi.org/10.1051/jp4:1998726 RésuméPDF (583.5 KB)
Pulsed discharges produced by surface waves p. Pr7-317 O.A. Ivanov, A.M. Gorbachev, V.A. Koldanov, A.L. Kolisko et A.L. Vikharev DOI: https://doi.org/10.1051/jp4:1998727 RésuméPDF (525.8 KB)
Diagnostics on a pulsed surface-wave discharge p. Pr7-327 G. Himmel, I. Koleva et H. Schlüter DOI: https://doi.org/10.1051/jp4:1998728 RésuméPDF (340.6 KB)
Spectroscopic diagnostics of high pressure discharges p. Pr7-339 A. Gamero DOI: https://doi.org/10.1051/jp4:1998729 RésuméPDF (510.4 KB)
Microwave torch combined with conventional burner p. Pr7-349 J. Janca et A. Tálský DOI: https://doi.org/10.1051/jp4:1998730 RésuméPDF (793.9 KB)
High pressure discharges for chemical analysis p. Pr7-357 J. Hubert et R. Sing DOI: https://doi.org/10.1051/jp4:1998731 RésuméPDF (878.7 KB)
Plasma chemistry of nonequilibrium microwave discharges. Status and tendency p. Pr7-369 Yu.A. Lebedev DOI: https://doi.org/10.1051/jp4:1998732 RésuméPDF (650.5 KB)
Nitrogen-oxygen and hydrogen discharges p. Pr7-381 A.A. Matveyev et V.P. Silakov DOI: https://doi.org/10.1051/jp4:1998733 RésuméPDF (972.3 KB)
Role of the plasma composition at the surface on diamond growth p. Pr7-391 S. Farhat, C. Findeling, F. Silva, K. Hassouni et A. Gicquel DOI: https://doi.org/10.1051/jp4:1998734 RésuméPDF (405.1 KB)
Microwave reactors for plasma chemistry p. Pr7-401 V. Jivotov DOI: https://doi.org/10.1051/jp4:1998735 RésuméPDF (925.6 KB)
Plasma catalytic reaction in ammonia synthesis in the microwave discharge p. Pr7-411 O. Matsumoto DOI: https://doi.org/10.1051/jp4:1998736 RésuméPDF (454.7 KB)
