J. Phys. IV France
Volume 05, Numéro C5, Juin 1995Proceedings of the Tenth European Conference on Chemical Vapour Deposition
|Page(s)||C5-183 - C5-190|
J. Phys. IV France 05 (1995) C5-183-C5-190
A Study of CVD of Gallium Nitride Films by In Situ Gas-Phase UV SpectroscopyS.E. Alexandrov, A.Y. Kovalgin and D.M. Krasovitskiy
Department of Electronic Materials Technology, Sr.-Petersburg State Technical University, Polytechnical Str. 29, St.-Petersburg, 195 251, Russia
Direct "in situ" UV spectroscopic analysis of the gas phase was performed during chemical vapour deposition of gallium nitride films based on pyrolysis of GaCl3NH3 complexes. The most probable mechanism of film formation is proposed on the basis of the experimental results obtained.
© EDP Sciences 1995