Journal de Physique IV

Thirteenth European Conference on Chemical Vapor Deposition

J. Phys. IV France 11 (2001) Pr3-141-Pr3-148
DOI: 10.1051/jp4:2001317

Kinetics of LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia GaCl₃NH₃

S.E. Alexandrov and V.A. Kriakin

Department of Electronic Materials Technology, St. Petersburg State Technical University, Polytechnical Str. 29, St. Petersburg 195251, Russia

Abstract
The results of an experimental study on the kinetics of the LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia, GaCl₃NH₃, are presented. The conclusions are made taking into account the results of UV spectroscopy of the reacting gas phase.

Kinetics of LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia GaCl3NH3

Kinetics of LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia GaCl₃NH₃