J. Phys. IV France
Volume 03, Numéro C3, Août 1993Proceedings of the Ninth European Conference on Chemical Vapour Deposition
|Page(s)||C3-571 - C3-578|
J. Phys. IV France 03 (1993) C3-571-C3-578
SiC-TiSi2 materials codeposited by CVDM. MALINE, F. TEYSSANDIER and R. HILLEL
IMP-CNRS, Université de Perpignan, 66860 Perpignan cedex, France
Abstract SiC - TiSi2 composites were prepared by CVD under atmospheric pressure at 850°C using the TiCl4 - SiH2Cl2 - C4H10 - H2 gas system. Thermodynamical calculation trends, dealing with the influence of the initial gas phase composition on the amount of TiSi2 were compared with the experiments. Codeposits were texture-free. Apparent crystallite size was ranging between 20 to 50nm. Intrinsic hardness deduced from the extrapolation at infinite load of measured values, fitted well with that given by a rule mixture : H∞=VTiSi2.HTiSi2+(l-VTiSi2).HSiC. Using indentation technique, median-radial crack system was observed. Values of toughness were about 35 to 50 % greater than for a pure SiC-CVD depending on the amount of TiSi2.
© EDP Sciences 1993