| Numéro |
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | C3-563 - C3-570 | |
| DOI | https://doi.org/10.1051/jp4:1993378 | |
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
J. Phys. IV France 03 (1993) C3-563-C3-570
DOI: 10.1051/jp4:1993378
Laboratoire Marcel Mathieu, UMR 124, CNRS-DRET-UPPA, Centre Hélioparc, 2 avenue Angot, 64000 Pau, France
© EDP Sciences 1993
J. Phys. IV France 03 (1993) C3-563-C3-570
DOI: 10.1051/jp4:1993378
Chemical vapor deposition of pyrolytic carbon on polished substrates
J.-F. DESPRÉS, C. VAHLAS and A. OBERLINLaboratoire Marcel Mathieu, UMR 124, CNRS-DRET-UPPA, Centre Hélioparc, 2 avenue Angot, 64000 Pau, France
Abstract
Pyrolytic carbon thin (4-100 nm) films were obtained from méthane in a hot wall reactor on optically polished inert substrates by varying the déposition time and temperature. They were characterized by all modes of TEM. They are composed in majority of lamellar pyrocarbon whose thickness and disorder increases with increasing temperature. Isotropic carbon islands are also observed at the upper surface of the film.
© EDP Sciences 1993