Issue
J. Phys. IV France
Volume 11, Number PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
Page(s) Pr3-141 - Pr3-148
DOI https://doi.org/10.1051/jp4:2001317
Thirteenth European Conference on Chemical Vapor Deposition

J. Phys. IV France 11 (2001) Pr3-141-Pr3-148

DOI: 10.1051/jp4:2001317

Kinetics of LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia GaCl3NH3

S.E. Alexandrov and V.A. Kriakin

Department of Electronic Materials Technology, St. Petersburg State Technical University, Polytechnical Str. 29, St. Petersburg 195251, Russia


Abstract
The results of an experimental study on the kinetics of the LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia, GaCl3NH3, are presented. The conclusions are made taking into account the results of UV spectroscopy of the reacting gas phase.



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