| Numéro |
J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
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|---|---|---|
| Page(s) | Pr3-141 - Pr3-148 | |
| DOI | https://doi.org/10.1051/jp4:2001317 | |
Thirteenth European Conference on Chemical Vapor Deposition
J. Phys. IV France 11 (2001) Pr3-141-Pr3-148
DOI: 10.1051/jp4:2001317
Department of Electronic Materials Technology, St. Petersburg State Technical University, Polytechnical Str. 29, St. Petersburg 195251, Russia
© EDP Sciences 2001
J. Phys. IV France 11 (2001) Pr3-141-Pr3-148
DOI: 10.1051/jp4:2001317
Kinetics of LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia GaCl3NH3
S.E. Alexandrov and V.A. KriakinDepartment of Electronic Materials Technology, St. Petersburg State Technical University, Polytechnical Str. 29, St. Petersburg 195251, Russia
Abstract
The results of an experimental study on the kinetics of the LPCVD of gallium nitride and oxynitride films based on pyrolysis of a gallium chloride complex with ammonia, GaCl3NH3, are presented. The conclusions are made taking into account the results of UV spectroscopy of the reacting gas phase.
© EDP Sciences 2001