J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
Page(s) Pr3-363 - Pr3-369
Thirteenth European Conference on Chemical Vapor Deposition

J. Phys. IV France 11 (2001) Pr3-363-Pr3-369

DOI: 10.1051/jp4:2001346

Photodegradative properties of TiO2 films prepared by MOCVD

I. Justicia1, J.A. Ayllón1, A. Figueras1, G.A. Battiston2 and R. Gerbasi2

1  Institut de Ciència de Materials de Barcelona, CSIC, Campus de la U.A.B., 08193 Bellaterra, Spain
2  Istituto di Chimica e Tecnologie Inorganiche e dei Materiali Avanzati del CNR, Corso Stati Uniti 4, 35127 Padova, Italy

TiO2 is a well-known photocatalist for the air-oxydation of organic compounds. This paper deals with the preparation of TiO2 layers by MOCVD. The photodegradation rate has been studied in the presence of aqueous suspensions (methylene blue) as a function of the film thickness, roughness and crystallite preferred orientation. These results are compared with aqueous suspensions of Degussa P-25 powders. Deposits obtained on fused quartz showed a higher photodegradation rate than those prepared on glass, while Degussa powders exhibited an intermediate value.

© EDP Sciences 2001