| Numéro |
J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
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|---|---|---|
| Page(s) | Pr3-363 - Pr3-369 | |
| DOI | https://doi.org/10.1051/jp4:2001346 | |
Thirteenth European Conference on Chemical Vapor Deposition
J. Phys. IV France 11 (2001) Pr3-363-Pr3-369
DOI: 10.1051/jp4:2001346
1 Institut de Ciència de Materials de Barcelona, CSIC, Campus de la U.A.B., 08193 Bellaterra, Spain
2 Istituto di Chimica e Tecnologie Inorganiche e dei Materiali Avanzati del CNR, Corso Stati Uniti 4, 35127 Padova, Italy
© EDP Sciences 2001
J. Phys. IV France 11 (2001) Pr3-363-Pr3-369
DOI: 10.1051/jp4:2001346
Photodegradative properties of TiO2 films prepared by MOCVD
I. Justicia1, J.A. Ayllón1, A. Figueras1, G.A. Battiston2 and R. Gerbasi21 Institut de Ciència de Materials de Barcelona, CSIC, Campus de la U.A.B., 08193 Bellaterra, Spain
2 Istituto di Chimica e Tecnologie Inorganiche e dei Materiali Avanzati del CNR, Corso Stati Uniti 4, 35127 Padova, Italy
Abstract
TiO2 is a well-known photocatalist for the air-oxydation of organic compounds. This paper deals with the preparation of TiO2 layers by MOCVD. The photodegradation rate has been studied in the presence of aqueous suspensions (methylene blue) as a function of the film thickness, roughness and crystallite preferred orientation. These results are compared with aqueous suspensions of Degussa P-25 powders. Deposits obtained on fused quartz showed a higher photodegradation rate than those prepared on glass, while Degussa powders exhibited an intermediate value.
© EDP Sciences 2001