J. Phys. IV France
Volume 09, Numéro PR8, September 1999Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|Page(s)||Pr8-915 - Pr8-921|
J. Phys. IV France 09 (1999) Pr8-915-Pr8-921
LPCVD boron carbonitride films from triethylamine boraneM.L. Kosinova, N.I. Fainer, Yu.M. Rumyantsev, A.N. Golubenko and F.A. Kuznetsov
Institute of Inorganic Chemistry, SB RAS, 3 Acad. Lavrentjev Pr., Novosibirsk 630090, Russia
Thin films of the B-C-N system have been synthesised by low pressure chemical vapour deposition and plasma enhanced chemical vapour deposition using liquid single source precursor triethylamine borane complex (TEAB) both with and without ammonia. The growth rates, refractive index, types of chemical bonds, the crystal structure and phase composition of films were studied depending on the growth conditions. The thermodynamic analysis of the B-N-C-H system is presented.
© EDP Sciences 1999