| Numéro |
J. Phys. IV France
Volume 09, Numéro PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|
|
|---|---|---|
| Page(s) | Pr8-915 - Pr8-921 | |
| DOI | https://doi.org/10.1051/jp4:19998115 | |
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
J. Phys. IV France 09 (1999) Pr8-915-Pr8-921
DOI: 10.1051/jp4:19998115
Institute of Inorganic Chemistry, SB RAS, 3 Acad. Lavrentjev Pr., Novosibirsk 630090, Russia
© EDP Sciences 1999
J. Phys. IV France 09 (1999) Pr8-915-Pr8-921
DOI: 10.1051/jp4:19998115
LPCVD boron carbonitride films from triethylamine borane
M.L. Kosinova, N.I. Fainer, Yu.M. Rumyantsev, A.N. Golubenko and F.A. KuznetsovInstitute of Inorganic Chemistry, SB RAS, 3 Acad. Lavrentjev Pr., Novosibirsk 630090, Russia
Abstract
Thin films of the B-C-N system have been synthesised by low pressure chemical vapour deposition and plasma enhanced chemical vapour deposition using liquid single source precursor triethylamine borane complex (TEAB) both with and without ammonia. The growth rates, refractive index, types of chemical bonds, the crystal structure and phase composition of films were studied depending on the growth conditions. The thermodynamic analysis of the B-N-C-H system is presented.
© EDP Sciences 1999