J. Phys. IV France
Volume 03, Numéro C3, Août 1993Proceedings of the Ninth European Conference on Chemical Vapour Deposition
|Page(s)||C3-557 - C3-562|
J. Phys. IV France 03 (1993) C3-557-C3-562
Chemical vapour deposition of Al2O3 on titanium oxidesE. FREDRIKSSON and J.-O. CARLSSON
Thin Film and Surface Chemistry Group, Institute of Chemistry, Uppsala University, Box 521, 751 21 Uppsala, Sweden
The morphology of chemically vapour deposited α-Al2O3, developed on different titanium oxides, was studied. Ti2O3, Ti3O5 and TiO2 were used as substrate materials. The titanium oxides and the α-Al2O3, were grown by the TiCl4/H2/CO2, and the AlCl3/H2/CO2 processes, respectively, usually at 1000°C and 6.7×103 Pa. No considerable difference in morphology of α-Al2O3 on the different titanium oxides were obtained. The α-Al2O3 grains were larger on Ti2O3 than on Ti3O5 and TiO2.
© EDP Sciences 1993