| Numéro |
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | C3-557 - C3-562 | |
| DOI | https://doi.org/10.1051/jp4:1993377 | |
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
J. Phys. IV France 03 (1993) C3-557-C3-562
DOI: 10.1051/jp4:1993377
Thin Film and Surface Chemistry Group, Institute of Chemistry, Uppsala University, Box 521, 751 21 Uppsala, Sweden
© EDP Sciences 1993
J. Phys. IV France 03 (1993) C3-557-C3-562
DOI: 10.1051/jp4:1993377
Chemical vapour deposition of Al2O3 on titanium oxides
E. FREDRIKSSON and J.-O. CARLSSONThin Film and Surface Chemistry Group, Institute of Chemistry, Uppsala University, Box 521, 751 21 Uppsala, Sweden
Abstract
The morphology of chemically vapour deposited α-Al2O3, developed on different titanium oxides, was studied. Ti2O3, Ti3O5 and TiO2 were used as substrate materials. The titanium oxides and the α-Al2O3, were grown by the TiCl4/H2/CO2, and the AlCl3/H2/CO2 processes, respectively, usually at 1000°C and 6.7×103 Pa. No considerable difference in morphology of α-Al2O3 on the different titanium oxides were obtained. The α-Al2O3 grains were larger on Ti2O3 than on Ti3O5 and TiO2.
© EDP Sciences 1993