J. Phys. IV France
Volume 03, Numéro C3, Août 1993Proceedings of the Ninth European Conference on Chemical Vapour Deposition
|Page(s)||C3-361 - C3-366|
J. Phys. IV France 03 (1993) C3-361-C3-366
Effect of CVD process parameters on phase and chemical composition of BSCCO thin filmsV.N. FUFLYIGIN, A.R. KAUL and S.A. POZIGUN
Chemistry Department, Moscow State University, 119899, Moscow V-234, Russia
Superconducting BSCCO thin films were obtained with high deposition rate (about 35 nm/min) at temperatures of 720-810°C by MOCVD-technique. Characteristics of evaporation process of precursors were determined. The influence of deposition temperature and oxygen partial pressure on superconducting phase formation and chemical composition of the films was studied.
© EDP Sciences 1993