| Numéro |
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
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| Page(s) | C2-587 - C2-592 | |
| DOI | https://doi.org/10.1051/jp4:1991270 | |
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
J. Phys. IV France 02 (1991) C2-587-C2-592
DOI: 10.1051/jp4:1991270
Central Institute of Solid State Physics and Materials Research, Helmholzstr. 20, D-0-8027 Dresden, Germany
© EDP Sciences 1991
J. Phys. IV France 02 (1991) C2-587-C2-592
DOI: 10.1051/jp4:1991270
CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS
D. SELBMANN, A. LEONHARDT and E. WOLFCentral Institute of Solid State Physics and Materials Research, Helmholzstr. 20, D-0-8027 Dresden, Germany
Abstract
For the Ti-Al-O-C-system it is shown that it is possible to produce good quality deposits of both single-phase TiAlOC or Al2O3-layers and heterogeneous layers of TiAlOC and Al2O3 under normal pressure-CVD-conditions using a reaction gas mixture of TiCl4, AlCl3, H2 and a CO/CO2-mixture.
© EDP Sciences 1991