CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS

D. SELBMANN; A. LEONHARDT; E. WOLF

doi:doi:10.1051/jp4:1991270

Numéro		J. Phys. IV France Volume 02, Numéro C2, Septembre 1991 Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse


Page(s)		C2-587 - C2-592
DOI		https://doi.org/10.1051/jp4:1991270

Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse

J. Phys. IV France 02 (1991) C2-587-C2-592
DOI: 10.1051/jp4:1991270

CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGS

D. SELBMANN, A. LEONHARDT and E. WOLF

Central Institute of Solid State Physics and Materials Research, Helmholzstr. 20, D-0-8027 Dresden, Germany

Abstract
For the Ti-Al-O-C-system it is shown that it is possible to produce good quality deposits of both single-phase TiAlOC or Al₂O₃-layers and heterogeneous layers of TiAlOC and Al₂O₃ under normal pressure-CVD-conditions using a reaction gas mixture of TiCl₄, AlCl₃, H₂ and a CO/CO₂-mixture.