J. Phys. IV France 02 (1991) C2-587-C2-592
CHEMICAL VAPOUR DEPOSITION OF Al-CONTAINING TiC - AND Ti(O,C) - HARD COATINGSD. SELBMANN, A. LEONHARDT and E. WOLF
Central Institute of Solid State Physics and Materials Research, Helmholzstr. 20, D-0-8027 Dresden, Germany
For the Ti-Al-O-C-system it is shown that it is possible to produce good quality deposits of both single-phase TiAlOC or Al2O3-layers and heterogeneous layers of TiAlOC and Al2O3 under normal pressure-CVD-conditions using a reaction gas mixture of TiCl4, AlCl3, H2 and a CO/CO2-mixture.
© EDP Sciences 1991