| Issue |
J. Phys. IV France
Volume 04, Number C7, Juillet 1994
8th International Topical Meeting on Photoacoustic and Photothermal Phenomena8 ITMP3 / 8éme conférence internationale de photoacoustique et photothermique |
|
|---|---|---|
| Page(s) | C7-639 - C7-642 | |
| DOI | https://doi.org/10.1051/jp4:19947151 | |
8th International Topical Meeting on Photoacoustic and Photothermal Phenomena
8 ITMP3 / 8éme conférence internationale de photoacoustique et photothermique
J. Phys. IV France 04 (1994) C7-639-C7-642
DOI: 10.1051/jp4:19947151
1 Laboratoire d'Optique Physique, UPR A0005 du CNRS, ESPCI, 10 rue Vauquelin, 75005 Paris, France
2 SOPRA, 26 rue P. Joigneaux, 92270 Bois-Colombes, France
© EDP Sciences 1994
8 ITMP3 / 8éme conférence internationale de photoacoustique et photothermique
J. Phys. IV France 04 (1994) C7-639-C7-642
DOI: 10.1051/jp4:19947151
Heat flow measurement in thin films by time resolved ellipsometry
H. El Rhaleb1, J.P. Roger1, J.L. Stéhlé2 and A.C. Boccara11 Laboratoire d'Optique Physique, UPR A0005 du CNRS, ESPCI, 10 rue Vauquelin, 75005 Paris, France
2 SOPRA, 26 rue P. Joigneaux, 92270 Bois-Colombes, France
Abstract
Time resolved ellipsometry is applied to investigate heat diffusion processes occurring in polymer coated silicon under pulsed excitation. Experimental results, modelisation and analysis are presented.
© EDP Sciences 1994