| Numéro |
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
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| Page(s) | C2-505 - C2-505 | |
| DOI | https://doi.org/10.1051/jp4:1991262 | |
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
J. Phys. IV France 02 (1991) C2-505-C2-505
DOI: 10.1051/jp4:1991262
Leybold AG, Siemensstrasse 100, D-8755 Alzenau, Germany
© EDP Sciences 1991
J. Phys. IV France 02 (1991) C2-505-C2-505
DOI: 10.1051/jp4:1991262
HIGH QUALITY OXIDES FOR LARGE AREA DISPLAYS
L.M. JOHNSON, M. SAUNDERS and D.B. MEAKINLeybold AG, Siemensstrasse 100, D-8755 Alzenau, Germany
Abstract
Great interest has been shown over recent years in the development of large area polysilicon active matrix displays. Availability of a reliable process for gate oxide formation over large area has proved a major barrier, despite significant advances in similar wager processing systems. A system has been developed for deposition of low temperature oxides on large area (up to 14x14 inches) glass substrates. The characteristics of the deposited films have been studied and the suitability of the process and equipment for large area displays will be demonstrated.
© EDP Sciences 1991