J. Phys. IV France
Volume 12, Numéro 4, June 2002
Page(s) 63 - 68

J. Phys. IV France
12 (2002) Pr4-63
DOI: 10.1051/jp4:20020078

Advances in the use of MOCVD methods for the production of novel photonic bandgap materials

D.E. Whitehead1, M.E. Pemble1, H.M. Yates1, A. Blanco2, C. Lopez2, H. Miguez2 and F.J. Meseguer2

1  School of Sciences, University of Salford, Salford M5 4WT, U.K.
2  Instituto de Ciencia de Materiales de Madrid, CSIC, Campus de Cantoblanco, 28049 Madrid, Spain

We describe the use of novel MOCVD methods designed to infill templated structures based upon synthetic opals in order to provide increased refractive index contrast necessary for the creation of full photonic bandgap materials. The method employed is illustrated by considering the production of structures containing III-V material Gap and using this example, we demonstrate the ability to achieve levels of infill higher than any previously reported. We describe the use of novel MOCVD chemistry in the creation of a potentially new class of inorganic material, potentially capable of direct luminescence from within the photonic bandgap system.

© EDP Sciences 2002