| Numéro |
J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
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|---|---|---|
| Page(s) | Pr3-155 - Pr3-161 | |
| DOI | https://doi.org/10.1051/jp4:2001319 | |
Thirteenth European Conference on Chemical Vapor Deposition
J. Phys. IV France 11 (2001) Pr3-155-Pr3-161
DOI: 10.1051/jp4:2001319
Department of Electronic Materials Technology, St. Petersburg State Technical University, Polytechnical Str. 29, St Petersburg 195251, Russia
© EDP Sciences 2001
J. Phys. IV France 11 (2001) Pr3-155-Pr3-161
DOI: 10.1051/jp4:2001319
Kinetics of LPCVD of aluminium nitride films based on pyrolysis of aluminium chloride complex
S.E. Alexandrov and V.A. ChistiakovDepartment of Electronic Materials Technology, St. Petersburg State Technical University, Polytechnical Str. 29, St Petersburg 195251, Russia
Abstract
The main purpose of this paper is to summarise the results of an experimental study of the LPCVD kinetics of aluminium nitride films based on the pyrolysis of the aluminium chloride complex with ammonia, AlCl3NH3. The conclusions drawn are supported by the results of mass-spectrometry of the gas phase reactants.
© EDP Sciences 2001