J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
Page(s) Pr3-3 - Pr3-15
Thirteenth European Conference on Chemical Vapor Deposition

J. Phys. IV France 11 (2001) Pr3-3-Pr3-15

DOI: 10.1051/jp4:2001301

Thermodynamic, kinetic and mass transport calculations, as the basis for materials processing by CVD

C. Bernard

Laboratoire de Thermodynamique et Physicochimie Métallurgiques, UMR 5614 du CNRS, INPG/UJF, Institut National Polytechnique de Grenoble, BP. 75, 38402 Saint-Martin-d'Hères, France

What is the best way to optimise a CVD process ? If all data are available (which is most improbable) it would be possible to achieve accurate modelling of a system with any degree of complexity. In reality, far fewer data exist, leading to a trade-off between system complexity and model complexity. Using numerous examples it will be demonstrated that it is often possible to satisfy the two main requirements. First of all, to provide information for the needs of experimentation, which is a pressing demand, and secondly, to reach a fundamental understanding of the chemistry involved in the CVD process, which is a long and exacting task.

© EDP Sciences 2001