| Numéro |
J. Phys. IV France
Volume 10, Numéro PR6, April 2000
The Sixth Japan-France Materials Science SeminarJFMSS-6 Microstructural Design for Improved Mechanical Behaviour of Advanced Materials |
|
|---|---|---|
| Page(s) | Pr6-65 - Pr6-69 | |
| DOI | https://doi.org/10.1051/jp4:2000612 | |
The Sixth Japan-France Materials Science Seminar
JFMSS-6
Microstructural Design for Improved Mechanical Behaviour of Advanced Materials
J. Phys. IV France 10 (2000) Pr6-65-Pr6-69
DOI: 10.1051/jp4:2000612
Laboratoire de Métallurgie Physique, UMR 6630 du CNRS, Université de Poitiers, UFR Sciences, BP. 30179, 86960 Futuroscope Chasseneuil cedex, France
© EDP Sciences 2000
JFMSS-6
Microstructural Design for Improved Mechanical Behaviour of Advanced Materials
J. Phys. IV France 10 (2000) Pr6-65-Pr6-69
DOI: 10.1051/jp4:2000612
Island formation by stress induced diffusion on the surface of a very thin layer epitaxially stressed on a substrate
J. Colin and J. GrilhéLaboratoire de Métallurgie Physique, UMR 6630 du CNRS, Université de Poitiers, UFR Sciences, BP. 30179, 86960 Futuroscope Chasseneuil cedex, France
Abstract
Island formation by stress-induced surface diffusion of an epitaxially stressed thin film has been studied by considering the possibility of dislocation nucleation when the thickness of the film is of the order of the Matthews critical thickness. Using some well-known results on stress induced surface diffusion and on the development of Grinfeld instabilities, island formation on the surface has been predicted.
© EDP Sciences 2000