J. Phys. IV France
Volume 09, Numéro PR8, September 1999Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|Page(s)||Pr8-237 - Pr8-244|
J. Phys. IV France 09 (1999) Pr8-237-Pr8-244
Modelling of nanosecond LCVD of 3D metal micropatternsE.F. Reznikova and I.K. Igumenov
Institute of Inorganic Chemistry, Ac. Lavrentiev Prosp. 3, 630090 Novosibirsk, Russia
Modelling of LCVD of metal film micropatterns under the action of a high-power nanosecond pulse UV laser was perfomed on the basis of the analysis of experimental data, calculation of laserinduced temperature field and mass-transport fluxes. It is shown that the reaction zone is limited in time by the laser-induced temperature pulse. It is stated that continuous metal films of uniform thickness are deposited as a result of laser-induced themolysis of the adsorbed layer of the initial molecules, the filling degree of this layer exceeding 1. Spatial and time localisation of the reaction zone is characterised depending on the deposition time at the stages of nuclei formation, formation of a continuous metal film, and increase in its thickness. The conditions to govern the reaction zone localisation are determined.
© EDP Sciences 1999