| Numéro |
J. Phys. IV France
Volume 09, Numéro PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
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|
|---|---|---|
| Page(s) | Pr8-229 - Pr8-236 | |
| DOI | https://doi.org/10.1051/jp4:1999828 | |
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
J. Phys. IV France 09 (1999) Pr8-229-Pr8-236
DOI: 10.1051/jp4:1999828
Belgrade University, Faculty of Technology and Metallurgy, Kamegijeva 4, 11001 Belgrade, Yugoslavia
© EDP Sciences 1999
J. Phys. IV France 09 (1999) Pr8-229-Pr8-236
DOI: 10.1051/jp4:1999828
Kinetics of film growth in CVD reactions
K.T. RaicBelgrade University, Faculty of Technology and Metallurgy, Kamegijeva 4, 11001 Belgrade, Yugoslavia
Abstract
Theoretical aspect of film growth kinetics is discussed. Two approaches : microstuctural and transport phenomena are presented. An original model defined by the simplified laminar boundary layer theory is suggested. Using an example of experimental measurements, taken korn the literature, it is shown that it is not always easy to distinguish clearly between the various time laws to follow the real kinetics of CVD film growth.
© EDP Sciences 1999