J. Phys. IV France
Volume 09, Numéro PR8, September 1999Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
|Page(s)||Pr8-109 - Pr8-113|
J. Phys. IV France 09 (1999) Pr8-109-Pr8-113
In situ monitoring of atmospheric pressure tin oxide CVD using near-infrared diode laser spectroscopyR.J. Holdsworth1, P.A. Martin1, D. Raisbeck2 and M.E. Pemble3
1 Department of Chemical and Biological Sciences, University of Huddersfield, Queensgate, Huddersfield, U.K.
2 Pilkington Technology Research Centre, Hall Lane, Lathom, Ormskirk, Lanes, U.K.
3 Department of Chemistry, University of Salford, Salford M5 4WT, U.K.
In situ near-IR diode laser absorption spectroscopy is a new technique which has been used to monitor reaction species involved in the atmospheric pressure tin oxide CVD deposition reaction. The system is entirely non-invasive and provides real-time analysis. Preliminary results obtained in the CVD deposition reaction of tin oxide onto a glass substrate in a small laboratory scale reactor is described. These will illustrate how sensitive the system is to small changes in reaction conditions which can then lead to much greater control over film qualities. Additionally, the light is easily transmitted through optical fibres to the reactor region to pass directly through the quartz reactor walls.
© EDP Sciences 1999