| Numéro |
J. Phys. IV France
Volume 09, Numéro PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
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|
|---|---|---|
| Page(s) | Pr8-117 - Pr8-132 | |
| DOI | https://doi.org/10.1051/jp4:1999815 | |
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
J. Phys. IV France 09 (1999) Pr8-117-Pr8-132
DOI: 10.1051/jp4:1999815
Delft University of Technology, Kramers Laboratorium voor Fysische Technologie, Prins Bernhardlaan 6, 2628 BW Delft, The Netherlands
© EDP Sciences 1999
J. Phys. IV France 09 (1999) Pr8-117-Pr8-132
DOI: 10.1051/jp4:1999815
Some recent developments in chemical vapor deposition process and equipment modeling
C.R. Kleijn, K.J. Kuijlaars, M. Okkerse, H. van Santen and H.E.A. van den AkkerDelft University of Technology, Kramers Laboratorium voor Fysische Technologie, Prins Bernhardlaan 6, 2628 BW Delft, The Netherlands
Abstract
An overview is given of the novel developments and trends in Chemical Vapor Deposition process and equipment modeling over the last five years. The developments are illustrated with three recent examples of the modeling research in the authors' group : Turbulent flow phenomena in cold-wall CVD reactors, selectivity loss in tungsten LPCVD, and acetylene combustion diamond CVD. Validations against experimental data, e.g. in situ temperature and concentration measurements, are shown. The incorporation of CVD simulation models into commercial software packages is discussed.
© EDP Sciences 1999