Numéro
J. Phys. IV France
Volume 06, Numéro C5, Septembre 1996
International Field Emission Society
IFES'96
Proceedings of the 43rd International Field Emission Symposium
Page(s) C5-59 - C5-64
DOI https://doi.org/10.1051/jp4:1996509
International Field Emission Society
IFES'96
Proceedings of the 43rd International Field Emission Symposium

J. Phys. IV France 06 (1996) C5-59-C5-64

DOI: 10.1051/jp4:1996509

Local Electric Field Variation in the Field Emission Process

A.S.C. Esperidião, N.B. de Oliveira and C.M.C. de Castilho

Instituto de Física, Universidade Federal da Bahia, Campus Universitário da Federação, 40210-340 Salvador, Bahia, Brazil


Abstract
Tunnelling probabilities in field emission processes are usually calculated assuming flat emitting surfaces. This corresponds to consider the electric field as a constant along the potential barrier. Previous work have shown the importance of taking into account image effects but neglecting local field variations. Even when the local field has been taken into account, a proper three dimensional calculation of the transmission coefficient was not performed. We discuss previous calculation models, their limitations and conclusions, comparing them with our model results. We have determined the transmission coefficient using a 3-D numerical integration process. Considering a completely planar surface and another one with an hemispherical protrusion superimposed on it, we could compare the relative influence of either the local field variation dong the potential barrier and image effects. These results lead to the conclusion that corrections due to the local field variation are of a magnitude that deserves to be considered, together as those resulting from the image potential.



© EDP Sciences 1996