| Numéro |
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
|
|
|---|---|---|
| Page(s) | C5-679 - C5-686 | |
| DOI | https://doi.org/10.1051/jphyscol:1995581 | |
J. Phys. IV France 05 (1995) C5-679-C5-686
DOI: 10.1051/jphyscol:1995581
A Comparative Study of Iron-Based Film Deposition from Iron Pentacarbonyl at 248 nm and 488 nm
I. Voicu1, R. Alexandrescu1, R. Cireasa1, I. Morjan1, D.C. Dumitras1, S. Mulenko2, A. Pogorelyi2 and A. Andrei31 Institute of Atomic Physics, Laser Department, P.O. Box MG-6, Bucharest, Romania
2 Institute of Metal Physics, Kiev, Ukraine
3 Institute of Nuclear Reactors, Pitesti, Romania
Abstract
Thin film deposition by laser irradiation of Fe(CO)5 at two radiation wavelengths (248 nm and 488 nm) was performed. A perpendicular geometry of irradiation was used. Maximum deposition rates of 14 Å/s at λ = 248 nm and 1.5 Å/s at λ = 488 nm were obtained, indicating a diffusion limited process. SEM analysis of film morphologies showed significant differencies in the nucleation and growth of films deposited at 248 nm and 488 nm. XPS surface analysis revealed a higher carbon content and carbidic phases in the surface of films deposited at 488 nm on SiO2 (quartz) substrates. Oxidized surface Fe phases were found in films, with increasing the exposure time to laser radiation. The film properties are discussed in connection with irradiation conditions and specific mechanisms involved.
© EDP Sciences 1995