J. Phys. IV France
Volume 05, Numéro C5, Juin 1995Proceedings of the Tenth European Conference on Chemical Vapour Deposition
|Page(s)||C5-615 - C5-619|
J. Phys. IV France 05 (1995) C5-615-C5-619
Deposition and Properties of Thin PECVD Carbon Films After Rapid Thermal AnnealingG. Beshkov, D. Dimitrov, S. Georgiev and T. Dimitrova
Institute of Solid State Physics, Bulgarian Academy of Sciences, Tzarigradsko Chaussee 72, Blvd. 1784 - Sofia, Bulgaria
In this work the properties of PECVD-carbon films before and after Rapid Thermal Annealing (RTA) are presented. The thickness of the investigated films is in the range 50 - 6000Å. The layers are annealed at 1400°C for different times of 1 s to 3 min in vacuum 5 x 10-5 Torr. Raman investigation has been performed before and after annealing.
© EDP Sciences 1995