Numéro
J. Phys. IV France
Volume 05, Numéro C5, Juin 1995
Proceedings of the Tenth European Conference on Chemical Vapour Deposition
Page(s) C5-339 - C5-343
DOI https://doi.org/10.1051/jphyscol:1995540
Proceedings of the Tenth European Conference on Chemical Vapour Deposition

J. Phys. IV France 05 (1995) C5-339-C5-343

DOI: 10.1051/jphyscol:1995540

Formation of Ti(OCN) Layers Under Glow Discharge Conditions

J.R. Sobiecki and T. Wierzchon

Department of Materials Science and Engineering, Warsaw University of Technology, 02-524 Warsaw, Narbutta 85, Poland


Abstract
By using a gaseous mixture composed of tetraisopropoxytitanium, nitrogen and hydrogen in PACVD process, we obtain Ti(OCN) layers of a good performrance properties, such as a high hardness and good resistance to corrosion and to frictional wear. The optimum temperature of the process is 500°C. At higher temperatures, the surface microhardness decreases. When the process is carried out at 700°C, a surface layer which contain titanium cannot be obtained, only a diffusive oxycarbonitrided layer forms. Spectral investigations by optical emission spectroscopy have shown that the active particles that take part in the formation of the Ti(OCN) type layer are titanium ion Ti, nitrogen particles : N, N2, NH, oxygen atoms and CN radicals coming from the gaseous atmosphere and also nitrogen from the pre-nitrided substrate.



© EDP Sciences 1995