| Numéro |
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
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|
|---|---|---|
| Page(s) | C3-503 - C3-510 | |
| DOI | https://doi.org/10.1051/jp4:1993370 | |
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
J. Phys. IV France 03 (1993) C3-503-C3-510
DOI: 10.1051/jp4:1993370
Materials Division, Vlaamse Instelling voor Technologisch Onderzoek (VITO), Boeretang 200, 2400 Mol, Belgium
© EDP Sciences 1993
J. Phys. IV France 03 (1993) C3-503-C3-510
DOI: 10.1051/jp4:1993370
Physical and tribological properties of a-Si1-xCx : H coatings prepared by r.f. plama-assisted chemical vapour deposition
J. SMEETS, J. MENEVE, R. JACOBS, L. EERSELS and E. DEKEMPENEERMaterials Division, Vlaamse Instelling voor Technologisch Onderzoek (VITO), Boeretang 200, 2400 Mol, Belgium
Abstract
a-Si1-xCx : H films deposited by r.f. plasma-assisted chemical
vapour deposition were studied as a function of their
composition. The friction and wear properties were investigated
with the help of a conventional ball-on-disc apparatus. These
results are correlated with chemical (Si/C atomic ratio) and
structural (Raman and infrared spectroscopy) properties. The
friction coefficient in a humid ambient atmosphere changes
markedly with the carbon fraction and reaches a value as low as
0.05 for coatings with 70 to 90 at.% C. The carbon-rich films
consist of diamond-like carbon with silicon.
© EDP Sciences 1993