| Numéro |
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | C3-501 - C3-501 | |
| DOI | https://doi.org/10.1051/jp4:1993369 | |
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
J. Phys. IV France 03 (1993) C3-501-C3-501
DOI: 10.1051/jp4:1993369
Max-Planck-Institut f. biophysikalische Chemie, Dept. Laserphysik, 3400 Göttingen, Germany
© EDP Sciences 1993
J. Phys. IV France 03 (1993) C3-501-C3-501
DOI: 10.1051/jp4:1993369
Laser applications in CVD
M. STUKEMax-Planck-Institut f. biophysikalische Chemie, Dept. Laserphysik, 3400 Göttingen, Germany
Abstract
With laser light of suitable wavelength and absorbed energy, spatial control and in-situ analysis of CVD processes can be achieved. Using UV photochemical decomposition of surface adsorbed precursors, patterned deposition of pure metal films with sub-µm accuracy can be done. This will be shown for Al as an example [1]. For the laser activated generation of free standing three-dimensional micro-objects, processes [2] with and without preformed substrate have been used and will be described. [1] F. Foulon, M.Stuke, Appl. Phys. A56(1993) 267-273 [2] O.Lehmann, M.Stuke, Appl.Phys. A53(1991)343-345
© EDP Sciences 1993