Numéro
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
Page(s) C3-273 - C3-280
DOI https://doi.org/10.1051/jp4:1993337
Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-273-C3-280

DOI: 10.1051/jp4:1993337

Comparative study of copper deposits obtained by thermal decomposition and photo-assisted chemical vapour deposition of 3-diketonate complexes

M. KARSI, A. REYNES and R. MORANCHO

Laboratoire des Matériaux, URA 445 du CNRS, Institut National Polytechnique de Toulouse, ENSCT, 118 route de Narbonne, 31077 Toulouse cedex, France


Abstract
The use of the Ba(thd)2 precursor, in the elaboration of thin superconductor layers by OMCVD, is not satisfactory because its volatility decreases when it is kept at the sublimation temperature during the deposition. In order to avoid this problem, fluorine complexes, such as Ba(hfa)2 can be used. Nevertheless, its thermal decomposition at high temperature induces the presence of baryum fluoride, which is harmful for obtaining superconductor films with high critical temperature. This work is aiming to study the elaboration of superconducting deposits at low temperature and without fluorine. We have undertaken a program based on a photo-assisted thermal decomposition of various organometallic compounds, which are used as precursors of superconductor layers. Photonic assistance enables to obtain copper deposits at 150°C. The results of the photo-assisted decomposition of Cu(thd)2 and Cu(hfa)2 are presented here.



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