| Numéro |
J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
|
|
|---|---|---|
| Page(s) | C3-265 - C3-272 | |
| DOI | https://doi.org/10.1051/jp4:1993336 | |
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
J. Phys. IV France 03 (1993) C3-265-C3-272
DOI: 10.1051/jp4:1993336
1 Laser Department, Institute of Atomic Physics, Bucharest MG-6, 76900, Romania
2 Institute for Nuclear Research, Pitesti, Romania
© EDP Sciences 1993
J. Phys. IV France 03 (1993) C3-265-C3-272
DOI: 10.1051/jp4:1993336
Deposition of titanium-based films by laser-assisted thermal CVD of titanium tetrachloride
R. ALEXANDRESCU1, R. CIREASA1, B. DRAGNEA1, I. MORJAN1, I. VOICU1 and A. ANDREI21 Laser Department, Institute of Atomic Physics, Bucharest MG-6, 76900, Romania
2 Institute for Nuclear Research, Pitesti, Romania
Abstract
The results of a study of laser-assisted CVD of thin titanium films from TiCl4 using a CO2 laser are pesented. The Ti-based layers deposited onto quartz substrates were investigated by XPS technics. The influence of the incident laser energy on the chemical content of films as well as on the film growth rate was pointed out. The experimental results indicate that, on quartz substrate a multilayer structure is formed with unsaturated TiSix at the interface and oxidized phases at the surface.
© EDP Sciences 1993