J. Phys. IV France
Volume 03, Numéro C3, Août 1993
Proceedings of the Ninth European Conference on Chemical Vapour Deposition
Page(s) C3-195 - C3-202
Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-195-C3-202

DOI: 10.1051/jp4:1993325

High temperature behaviour and oxidation resistance of carbon-boron-nitrogen compounds obtained by LPCVD


CNRS, Centre de Recherche Paul Pascal, avenue A. Schweitzer, 33600 Pessac, France

Coatings of carbon-boron-nitrogen compounds with various compositions are obtained in a low pressure chemical vapour deposition process using acetylene, boron trichloride, ammonia and hydrogen as input gases. Compositions are located in the ternary system C-BN-"BC3". The structure of the films is a graphitic turbostratic one for the whole composition range but carbonrich deposits exhibit greater coherence length Lc than boron nitride-rich ones. The high temperature behaviour is studied for three specific compositions : C0.82B0.14N0.04, C0.50B0.31N0.19 and C0.78B0.22. In an inert atmosphere no mass loss is observed up to 2250°C while graphitization and formation of boron carbide occur. Based on electron probe micro analysis, depletion of boron and nitrogen happens only in the few micrometers near the surface of the sample. Above 2500°C, B13C2 evaporates and a graphite-like material is formed. In a dry air atmosphere, oxidation occurs above 800°C with a slow kinetics. A boron oxide layer protects the sample up to 1000°C. Above this temperature, volatilization of B2O3 occurs and oxidation is greatly enhanced. Of special interest seems to be the C0.78B0.22 coating which exhibits the lowest oxidation rate. Such deposits could then present a way to protect carbon-carbon composites at moderate temperature in the form of an external coating or better of an intermediate layer between fibres and matrix.

© EDP Sciences 1993