| Numéro |
J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
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| Page(s) | C2-397 - C2-404 | |
| DOI | https://doi.org/10.1051/jp4:1991248 | |
Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
J. Phys. IV France 02 (1991) C2-397-C2-404
DOI: 10.1051/jp4:1991248
Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, TU Braunschweig, D-3300 Braunschweig, Germany
© EDP Sciences 1991
J. Phys. IV France 02 (1991) C2-397-C2-404
DOI: 10.1051/jp4:1991248
PLASMA ASSISTED CVD USING METALLO-ORGANIC COMPOUNDS AS PRECURSORS
K.-T. RIE, J. WÖHLE and A. GEBAUERInstitut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, TU Braunschweig, D-3300 Braunschweig, Germany
Abstract
In this work the use of three metallo-organic compounds was investigated with the pulsed DC plasma assisted CVD process to deposit layers on steel substrates and hard metals. The layers have been studied by SEM, XRD, WDX and ESCA. It is shown that chlorine free adhesive titanium carbonitride coatings can be obtained by MOCVD even at substrate temperatures less than 400 °C.
© EDP Sciences 1991