J. Phys. IV France 02 (1991) C2-397-C2-404
PLASMA ASSISTED CVD USING METALLO-ORGANIC COMPOUNDS AS PRECURSORSK.-T. RIE, J. WÖHLE and A. GEBAUER
Institut für Oberflächentechnik und Plasmatechnische Werkstoffentwicklung, TU Braunschweig, D-3300 Braunschweig, Germany
In this work the use of three metallo-organic compounds was investigated with the pulsed DC plasma assisted CVD process to deposit layers on steel substrates and hard metals. The layers have been studied by SEM, XRD, WDX and ESCA. It is shown that chlorine free adhesive titanium carbonitride coatings can be obtained by MOCVD even at substrate temperatures less than 400 °C.
© EDP Sciences 1991