| Issue |
J. Phys. IV France
Volume 125, June 2005
|
|
|---|---|---|
| Page(s) | 483 - 486 | |
| DOI | https://doi.org/10.1051/jp4:2005125113 | |
J. Phys. IV France 125 (2005) 483-486
DOI: 10.1051/jp4:2005125113
Advances in photothermal depth profiling
R. Li Voti1, I. Fiorini1, Z. Del Prete2, G.L. Liakhou3, S. Paoloni1, C. Sibilia1 and M. Bertolotti11 Dipartimento di Energetica, Università di Roma "La Sapienza", Via Scarpa 16, Roma, Italy
2 Dipartimento di Meccanica ed Aeronautica, Università di Roma "La Sapienza", Italy
3 Technical University of Moldova, Stefan Cel Mare 168, 277012 Kishinau, Moldova
Abstract
Photothermal depth profiling is usually applied to inhomogeneous materials, and allows to localize the optical inhomogeneity or retrieve the thermal effusivity depth profile by simple monitoring the surface temperature or any related photothermal signal after the pump beam pulse absorption. In this article we want to discuss two different kind of inverse problems; the heat source depth profiling (1
type), and the effusivity depth profiling (2
type). Finally we want to show the equivalence of the two problems, and provide some mathematical tools to get the solutions by the Thermal Wave Backscattering (TWBS).
© EDP Sciences 2005