| Issue |
J. Phys. IV France
Volume 09, Number PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
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|---|---|---|
| Page(s) | Pr8-923 - Pr8-928 | |
| DOI | https://doi.org/10.1051/jp4:19998116 | |
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
J. Phys. IV France 09 (1999) Pr8-923-Pr8-928
DOI: 10.1051/jp4:19998116
1 Moscow State University, Department of Chemistry, Leninskie Gory, 119899 Moscow, Russia
2 Kumakov Institute of General and Inorganic Chemistry, 117234 Moscow, Russia
3 Planar International Ltd., Olarinluoma 9, P.O. Box 46, 02201 Espoo, Finland
© EDP Sciences 1999
J. Phys. IV France 09 (1999) Pr8-923-Pr8-928
DOI: 10.1051/jp4:19998116
Silver pivalate as a new volatile precursor for thin film deposition
N. Kuzmina1, S. Paramonov1, R. Ivanov1, V. Kezko2, K. Polamo3 and S. Troyanov11 Moscow State University, Department of Chemistry, Leninskie Gory, 119899 Moscow, Russia
2 Kumakov Institute of General and Inorganic Chemistry, 117234 Moscow, Russia
3 Planar International Ltd., Olarinluoma 9, P.O. Box 46, 02201 Espoo, Finland
Abstract
to search a new volatile silver(I) precursor, the AgPiv complex (HPiv - 2,2-dimethylpropionic acid) has been prepared and characterized by elemental and TG analysis. Complex AgPiv is moisture stable and has rather low light sensitivity. An X-ray structure determination showed that the crystal structure of AgPiv consists of dimers, connected with each other by bridging Ag-O bonds. In addition, there are Ag...Ag contacts within dimers and between polymeric chains. It was found that AgPiv can be sublimed under dynamic vacuum (0.01-0.03 torr) at 230-250°C. The ALE experiments on SrS:Ag thin film growth were conducted with the use of AgPiv as volatile precursor.
© EDP Sciences 1999