| Issue |
J. Phys. IV France
Volume 7, Number C2, Avril 1997
Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure
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| Page(s) | C2-1249 - C2-1250 | |
| DOI | https://doi.org/10.1051/jp4:19972217 | |
Proceedings of the 9th International Conference on X-Ray Absorption Fine Structure
J. Phys. IV France 7 (1997) C2-1249-C2-1250
DOI: 10.1051/jp4:19972217
Center for Fundamental Physics, and Hefei Synchrotron Radiation Laboratory, University of Science & Technology of China, Hefei 230026, P.R. China
© EDP Sciences 1997
J. Phys. IV France 7 (1997) C2-1249-C2-1250
DOI: 10.1051/jp4:19972217
XAFS Study on the Microstructure of Mo/Si Multilayers
S. Wei, L. Wu, W. Liu and Zi. WuCenter for Fundamental Physics, and Hefei Synchrotron Radiation Laboratory, University of Science & Technology of China, Hefei 230026, P.R. China
Abstract
X-ray absorption fine structure(XAFS) was used to investigate the structure of Mo/Si multilayers from 20Å to 3000Å period value. The XAFS results show the structural disorder of Mo atom neighbor environment is significantly increased as the thickness of Mo layer is thinner. For 20Å and 50Å period Mo/Si multilayers, the polycrystalline Mo layer vanish, the first neighbor coordination of Mo atom is mainly surrounded by Si atoms, the intended small period structure were drastically destroyed by interdiffusion. The mixed layer is amorphous MoSi2. XAFS results confirm that there is no clear period structure in very small period Mo/Si multilayer.
© EDP Sciences 1997