Ellipsometric analysis for CVD thick films on weakly absorbing substrates

Abstract
Ellipsometry is a traditional technique for the thickness and the optical constants of CVD films determination, and if in situ film control is impossible, the best way is to use spectroellipsometry. The novel method for quick estimation of the film parameters in the case of weakly absorbing thick film (80 - 600 nm) on nonabsorbing substrate, using spectroellipsometry is presented. The experimental results for electronbeam assisted CVD ZrO₂ films on quartz, PECVD diamond and a-B/C : H films on Si (100) are reported and the influence of substrate absorption and intermediate layers presence is discussed. Both the thickness and the wave dependence of the film optical constants were calculated from the azimuth of polarization spectra in the range of 360-660nm.