| Numéro |
J. Phys. IV France
Volume 104, March 2003
|
|
|---|---|---|
| Page(s) | 255 - 258 | |
| DOI | https://doi.org/10.1051/jp4:200300074 | |
J. Phys. IV France 104 (2003) 255
DOI: 10.1051/jp4:200300074
High reflective Co xCr 1-x/C multilayer mirror for using X-ray photoemission spectroscopy in the wavelength region around 6 nm
H. Takenaka1, K. Nagai1, H. Ito1, S. Ichimaru1, T. Ohchi1, Y. Muramatsu2 and E.M. Gullikson31 NTT Advanced Technology Co., 162 Shirakata, Tokai, Ibaraki 319-1193, Japan
2 Japan Atomic Energy Research Institute, Kouto, Sayo-gun, Hyogo 679-5148, Japan
3 Lawrence Berkeley National Laboratory, Berkeley, M 94720, U.S.A.
Abstract
The development of highly reflective multilayer mirrors for use in the wavelength region around 6-nm is
desired for X-ray photoemission spectroscopy for inner-shell excitation using a Schwarzschild objective. For this
application, reflectivity is the most critical parameter determining the performance of multilayer mirrors, because the
reflectivity of multilayers in the 6-nm region is generally very low. We have fabricated the Co/C and Cr/C
multilayer mirrors by magnetron sputtering. The measured peak reflectivity of the Cr/C multilayer is about 18.9% at
the wavelength of 6.42 nm and the incident angle of 88° and the reflectivity of the Co/C multilayer is 10.1% at the
wavelength of 6.06 nm and the incident angle of 88°. The reflectivities of the Cr/C and Co
0.8Cr
0.2/C multilayers are
enough high. Therefore, we found that Cr/C or Co
Cr
/C multilayer is sufficiently used for Schwarzschild mirror
for X-ray photoemission spectroscopy at 6 nm X-ray.
© EDP Sciences 2003