J. Phys. IV France 104 (2003) 251
DOI: 10.1051/jp4:200300073

Fabrication of soft X-ray beam splitters for use in the wavelength region around 13 nm

H. Takenaka¹, S. Ichimaru¹, T. Haga², T. Ohchi¹, H. Ito¹, Y. Muramatsu³, E.M. Gullikson⁴ and R.C.C. Perera<sup>4

1</sup>  NTT Advanced Technology Co., 162 Shirakata, Tokai, Ibaraki 319-1193, Japan
²  NTT TMicrointegration System Laboratory, 3-1 Morinosafo Wakamiya, Atsugi, Kanagawa 243-0198, Japan
³  Japan Atomic Energy Research Institute, Kouto, Sayo-gun, Hyogo 679-5148, Japan
⁴  Lawrence Berkeley National Laboratory, Berkeley, CA 94720, U.S.A.

Abstract
Two kinds of soft X-ray beam splitters were fabricated for use at wavelengths around 13 nm: a Mo/Si multilayer beam splitter for near normal incidence and a Ru/SiN bilayer beam splitter for grazing incidence. In the wavelength region around 13 nm, measurements showed the Mo/Si multilayer beam splitter to have a reflectivity of 28% and a transmittance of 32% at a grazing incidenct angle of 80°, and the Ru/SiN bilayer beam splitter to have a reflectivity and transmittance of 11% at a grazing incidenct angle of 17.5°.

© EDP Sciences 2003