| Numéro |
J. Phys. IV France
Volume 09, Numéro PR8, September 1999
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
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|
|---|---|---|
| Page(s) | Pr8-387 - Pr8-393 | |
| DOI | https://doi.org/10.1051/jp4:1999848 | |
Proceedings of the Twelfth European Conference on Chemical Vapour Deposition
J. Phys. IV France 09 (1999) Pr8-387-Pr8-393
DOI: 10.1051/jp4:1999848
Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.
© EDP Sciences 1999
J. Phys. IV France 09 (1999) Pr8-387-Pr8-393
DOI: 10.1051/jp4:1999848
Atmospheric pressure chemical vapour deposition of chromium oxide films
I.P. Parkin and M.N. FieldDepartment of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, U.K.
Abstract
Cr2O3 films have been deposited on glass substrates by atmospheric pressure chemical vapour deposition reaction of chromyl chloride with either water, ethyl acetate, methanol or ethanol. Films were deposited in the temperature range 450 °C - 600 °C. The Cr2O3 films were characterised by glancing angle XRD, SEM and X-ray photoelectron spectroscopy. These analyses showed that singlephase Cr2O3 was obtained at all deposition temperatures.
© EDP Sciences 1999