Étude des interfaces enterrées par diffraction de rayons X

Abstract
X-ray diffraction (and/or diffusion) is a powerful tool for studying buried interfaces. The experimental X-ray techniques are reviewed, including reflectivity at low angle, extended reflectivity, non-specular diffuse scattering, grazing incidence diffractometry. The main results obtained recently on a variety of interfaces are presented briefly for different couples of solid or liquid materials. Semiconductor-semiconductor and semiconductor-metals were among the most heavily studied : the determination of roughness, steps correlation or localised interfacial structures are available on several systems. The advent of new generation X-ray synchrotron sources opens up new perspectives in this field.