Structures and properties of Y-ZrO2 thin films deposited by reactive r.f. sputtering

Y.-H. WANG; X.-P. LI

doi:doi:10.1051/jp4:1993386

Numéro		J. Phys. IV France Volume 03, Numéro C3, Août 1993 Proceedings of the Ninth European Conference on Chemical Vapour Deposition


Page(s)		C3-611 - C3-615
DOI		https://doi.org/10.1051/jp4:1993386

Proceedings of the Ninth European Conference on Chemical Vapour Deposition

J. Phys. IV France 03 (1993) C3-611-C3-615
DOI: 10.1051/jp4:1993386

Structures and properties of Y-ZrO₂ thin films deposited by reactive r.f. sputtering

Y.-H. WANG and X.-P. LI

Dept. Materials Science and Engineering Tsinghua University, Beijing 100084, China

Abstract
The Y-ZrO₂ thin films were deposited by r.f. magnetron sputtering method. The microstructure, phase composition and mechanical properties of the thin films were investigated. The studies show that the films had tiny grains, tetragonal phase, and the best properties when they were deposited at the condition of the low substrate temperature and zero oxygen partial pressure.