J. Phys. IV France 02 (1991) C2-617-C2-624
DEPOSITION OF BORON NITRIDE BY PLASMA ENHANCED CVD USING BORANE AMINEJ.G.M. BECHT1, A. BATH2, E. HENGST1, P.J. VAN DER PUT1 and J. SCHOONMAN1
1 Laboratory for Inorganic Chemistry, Delft University of Technology, Julianalaan 136, NL-2628 BL Delft, The Netherlands
2 C.L.O.E.S, E.S.S, University of Metz, 2 rue E. Balin, F-57078 Metz, France
BN has been deposited with plasma enhanced CVD using borane dimethyl amine and NH3. The resulting layers are stable in air, although they contain an excess of boron, the actual amount depending on the deposition conditions. The presence of relatively large amounts of carbon in the layers indicates the incomplete decomposition of the organic fragment. Generally the layers posses the turbostratic structure. Only when a large excess of NH3 is present in the gas phase does the cubic structure develop.
© EDP Sciences 1991