J. Phys. IV France
Volume 02, Numéro C2, Septembre 1991Proceedings of the Eighth European Conference on Chemical Vapour Deposition / Actes de la 8ème Confèrence Européenne sur les Dépôts Chimiques en Phase Gazeuse
|Page(s)||C2-467 - C2-474|
J. Phys. IV France 02 (1991) C2-467-C2-474
CVD OF SiC IN LARGE COATING VESSELSK. BRENNFLECK and H. REICH
Schunk Kohlenstofftechnik GmbH, GE Reinstgraphite, P.O. Box 64 20, D-6300 Giessen, Germany
In large coating vessels deposition processes are very sensitive to hydrodynamics and kinetics. As one is operating in practice far away from equilibrium thermodynamic predictions are of secondary importance. This partly explains discrepancies with results obtained in laboratory reactors. Therefore optimization of the heat transfer and the gas distribution is a fundamental prerequisite for homogeneous and well-defined depositions. Furthermore temperature increase with simultaneous decrease of the total pressure during a deposition cycle improves the uniformity of the coating along the reaction chamber.
© EDP Sciences 1991