J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
Page(s) Pr3-585 - Pr3-592
Thirteenth European Conference on Chemical Vapor Deposition

J. Phys. IV France 11 (2001) Pr3-585-Pr3-592

DOI: 10.1051/jp4:2001374

New volatile polyazolylborates of copper(I) for MOCVD

A. Drozdov1, S.I. Troyanov1, C. Pettinari2, F. Marchetti2, C. Santini2, R. Pettinari2, G.A. Battiston3 and R. Gerbasi3

1  Moscow State University, Chemistry Department, Vorobjevy Gory, 119899 Moscow, Russia
2  Dipartimento di Scienze Chimiche, Università degli Studi, Via S. Agostino 1, 62032 Camerino, Italy
3  Istituto di Chimica e Tecnologie Inorganiche e dei Materiali Avanzati del CNR, Corso Stati Uniti 4, 35127 Padua, Italy

The volatility of new bis- and tetrakis-(pyrazolyl)borates of copper(I) with monodentate tertiary phosphines recently prepared has been prepared by the reaction between CuCl, phosphine and KBH2pz2 or KBpz4 in CH3CN (Hpz is a pyrazole-type ligand) has been studied. The IR data in gas in a vast temperature region confirm the stability of precursors in vapour, suggesting the molecular structure in vapour being similar to that determined previously by X-ray diffraction. The dependence of the volatility on the number of the pyrazolyl-moieties and nature of phosphine is discussed. Film growth rates obtained from MOCVD experiments, as well as XRD and SEM data for copper films deposited by using [CuH2B(pz)2(PMePh2)2] as precursor are reported.

© EDP Sciences 2001