J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
Page(s) Pr3-445 - Pr3-451
Thirteenth European Conference on Chemical Vapor Deposition

J. Phys. IV France 11 (2001) Pr3-445-Pr3-451

DOI: 10.1051/jp4:2001356

Chemical vapour deposition - a promising method for production of different kinds of carbon nanotubes

A. Leonhardt, M. Ritschel, K. Bartsch, A. Graff, C. Täschner and J. Fink

Institut für Festkörper- und Werkstofforschung Dresden, Helmholtzstrasse 20, 01069 Dresden, Germany

Carbon nanostructures (fibres, multi and single walled tubes) have been synthesized by catalytic chemical vapour deposition. The catalyst material, deposition temperature and the used hydrocarbon are the main parameters responsible for the formation of the desired structure. In dependence on these parameters and by optimising the deposition process nanofibres with herringbone structure and tubular multiwalled nanotubes were deposited in large amounts and high purity. In the case of single wall nanotubes synthesis an aftertreatment and process is absolutely necessary to obtain material with high percentage of tubes. Layers of disordered and aligned multiwalled nanotubes were deposited on oxidised silicon substrates coated with thin sputtered metal layers (Co, permalloy) by using the micro-wave assisted plasma CVD process or the bias supported hot filament CVD method. The latter method allows relatively low deposition temperatures (550 - 750 °C. The obtained carbon modifications were characterised by scanning and transmission electron microscopy. Furthermore, the electron field mission of the CNT's layers were investigated.

© EDP Sciences 2001