Numéro
J. Phys. IV France
Volume 11, Numéro PR3, Août 2001
Thirteenth European Conference on Chemical Vapor Deposition
Page(s) Pr3-847 - Pr3-859
DOI https://doi.org/10.1051/jp4:20013106
Thirteenth European Conference on Chemical Vapor Deposition

J. Phys. IV France 11 (2001) Pr3-847-Pr3-859

DOI: 10.1051/jp4:20013106

Advances in chemically vapour deposited wear resistant coatings

S. Ruppi

Seco Tools AB, 73782 Fagersta, Sweden


Abstract
The aim of this paper is to review recent advances in the area of chemical vapour deposition of wear resistant coatings. The development of the coating structures from the early single TiC coatings to modern multilayer coatings of TiC, Ti(C,N) and Al2O3 will be described briefly. Enhanced techniques to deposit Ti(C,N) coatings at lower deposition temperatures leading to increased adhesion and toughness of the tool are dealt with. The chemical reactions occurring in the interfacial part of the cemented carbide substrate are explained and the interfacial structures of the coating-substrate and coating-coating interfaces are discussed in light of adhesion and cutting performance. Development of the first generation alumina layers with poor coating uniformity and undefined crystal structures to tailor-made Al2O3 coatings composed α-Al2O3, κ-Al2O3 or γ-Al2O3 modifications or combinations of these will be described. In addition to production scale aspects on deposition of Al2O3, recent developments concerning wear properties, stabilities and nucleation control of the α-Al2O3, κ-Al2O3, and γ-Al2O3, polymorphs will be reported.



© EDP Sciences 2001